纳米压印模板及光栅点阵制作
标准模板三
NEW
薄膜软模板 四英寸模板 六英寸模板概述
在科研中，很多用户需要用到光栅或点阵这些周期性的结构。有时用户不需要研究微纳米加工工艺，这样如果能花费低廉的价格买到这些成品将十分方便，只要接着从事后续的工作就可以了；有的用户自已拥有微纳米加工设备及经验，但纳米量级的尺寸要采用电子束曝光 可制备百纳米周期结构的紫外曝光、白光干涉等方法来进行加工，比如采用电子束曝光加工纳米级结构，若有效面积超过1平方厘米，占机时间会很长，并需要调整电子束光刻及干法刻蚀工艺来优化成品。
鉴于此，我们向用户提供光栅及点阵的纳米结构成品。衬底材料为硅单晶，可广泛应用于各类科学研究。
标准模板一
我们可提供纳米级微结构，衬底材料为硅单晶，广泛应用于科学研究。批量生产，质量有保证，且性价比高。
产品精度：
- 线宽/深度：±15%
- 周期精度：优于0.5%
- 衬底宽度和高度误差：± 0.2 mm
- 衬底厚度：0.675 ± 0.050 mm
具体规格如下表所示：
光栅纳米结构模板 (线条+间距) Linear Nanostamps (line+space)
| 序号 | 周期 |
沟槽深度
|
占空比 ①
|
线宽 ②
|
样片尺寸③
|
|
1
|
139 nm
|
50 nm
|
50%
|
69.5 nm
|
12.5×12.5×0.7 mm
|
|
2
|
139 nm
|
50 nm
|
50%
|
69.5 nm
|
25×25×0.7 mm ⑤
|
|
3
|
278 nm④
|
110 nm
|
50%
|
139 nm
|
12.5×12.5×0.7 mm
|
|
4
|
416.6 nm
|
110 nm
|
50%
|
208 nm
|
12.5×12.5×0.7 mm
|
|
5
|
500 nm
|
multiple ⑥
|
44%
|
220 nm
|
8×8.3×0.7 mm
|
|
6
|
500 nm
|
multiple ⑥
|
60%
|
300 nm
|
8×8.3×0.7 mm
|
|
7
|
555.5 nm
|
110 nm
|
50%
|
278 nm
|
20×9×0.7 mm
|
|
8
|
555.5 nm
|
140 nm
|
50%
|
278 nm
|
20×9×0.7 mm
|
|
9
|
555.5 nm
|
110 nm
|
29%
|
158 nm
|
20×9×0.7 mm
|
|
10
|
555.5 nm
|
140 nm
|
29%
|
158 nm
|
20×9×0.7 mm
|
|
11
|
600 nm
|
multiple ⑥
|
43%
|
260 nm
|
8×8.3×0.7 mm
|
|
12
|
600 nm
|
multiple ⑥
|
55%
|
330 nm
|
8×8.3×0.7 mm
|
|
13
|
606 nm
|
190 nm
|
50%
|
303 nm
|
29×12×0.7 mm
|
|
14
|
606 nm④
|
190 nm
|
50%
|
303 nm
|
29×12×0.7 mm
|
|
15
|
606 nm
|
190 nm
|
50%
|
303 nm
|
29×24.2×0.7 mm ⑤
|
|
16
|
675 nm
|
170 nm
|
32%
|
218 nm
|
24×10×0.7 mm
|
|
17
|
675 nm
|
170 nm
|
32%
|
218 nm
|
24×30.4×0.7 mm ⑤
|
|
18
|
700 nm
|
multiple ⑥
|
47%
|
330 nm
|
8×8.3×0.7 mm
|
|
19
|
700 nm
|
multiple ⑥
|
55%
|
375 nm
|
8×8.3×0.7 mm
|
|
20
|
833.3 nm
|
200 nm
|
50%
|
416 nm
|
12.5×12.5×0.7 mm
|
|
21
|
833.3 nm
|
200 nm
|
50%
|
416 nm
|
25×25×0.7 mm ⑤
|
①占空比表示线宽和周期的比率。
③第二个尺寸相当于沟槽的长度。
④scientific" grade offered at a discount. It has at least 80% of usable area. Up to 80/100 scratch/dig/particles and irregular substrate shape may present.
⑤可定做更大尺寸
⑥深度可做成150, 250 和 350 nm。
二维纳米模板（矩形或六边形）2D nanostamps (rectangular and hexagonal lattice)
|
序号
|
周期
|
晶格类型
|
沟槽深度
|
特征宽度
|
衬底尺寸
|
|
1
|
600 nm
|
rect post
|
multiple ①
|
195 nm
|
8×8.3×0.7mm
|
|
2
|
600 nm
|
rect post
|
multiple ①
|
275 nm
|
8×8.3×0.7mm
|
|
3
|
700 nm
|
rect post
|
multiple ①
|
260 nm
|
8×8.3×0.7mm
|
|
4
|
700 nm
|
rect post
|
multiple ①
|
350 nm
|
8×8.3×0.7mm
|
|
5
|
600 nm
|
hex post
|
multiple ①
|
165 nm
|
8×8.3×0.7mm
|
|
6
|
600 nm
|
hex post
|
multiple ①
|
240 nm
|
8×8.3×0.7mm
|
|
7
|
700 nm
|
hex post
|
multiple ①
|
220 nm
|
8×8.3×0.7mm
|
|
8
|
700 nm
|
hex post
|
multiple ①
|
290 nm
|
8×8.3×0.7mm
|
|
9
|
600 nm
|
hex hole
|
multiple ①
|
180 nm
|
8×8.3×0.7mm
|
|
10
|
700 nm
|
hex hole
|
multiple ①
|
200 nm
|
8×8.3×0.7mm
|
|
11
|
700 nm
|
hex hole
|
multiple ①
|
290 nm
|
8×8.3×0.7mm
|
①深度可做成150, 250 和 350 nm
| Line grating: | hex post： |
|
|
| rect post: | hex hole： |
|
|
标准模板二
我们可提供纳米级微结构，衬底材料为硅单晶，广泛应用于科学研究。批量生产，质量有保证，且性价比高。
|
产品精度：
|
产品说明：
|
具体规格如下表所示：
光栅结构（周期，线宽，高度，有效面积，衬底尺寸）
| Part No | Description | Image |
| Pattern 56 |
Line grating Period: 125 nm Linewidth: 60 nm Height: 120 nm Area: 18 x 18 mm2 Substrate: Si 18 x 18 mm2 |
|
| Pattern 35 |
Line arry Period: 150 nm Width: 75 nm Height: 150 nm Area: 15 x 15 mm2 Substrate: Si 15 x 15 mm2 |
|
|
Pattern 71 New! |
Line grating Period: 200 nm Linewidth: 100 nm Height: 60 nm or 90 nm Area: 25 x 25 mm2 Substrate: Si 25 x 25 mm2 |
|
| Pattern 2 |
Line grating Period: 300 nm Width: 170 nm Height: 170 nm Area: 30 x 30 mm2 Substrate: Si 30 x 30 mm2 |
|
|
Pattern 72 New! |
Line grating Period: 375 nm Linewidth: 175 nm Height: 150 nm Area: 20 x 20 mm2 Substrate: Si 20 x 20 mm2 |
|
| Pattern 28 |
Line grating Period: 550 nm Width: 288 nm Height: 300 nm Area: 20 x 20 mm2 Substrate: Si 20 x 20 mm2 |
|
| Pattern 53 |
Line grating Period: 600 nm Linewidth: 400 nm Height: 100 nm Area: 20 x 20 mm2 Substrate: Si 20 x 20 mm2 |
|
| Pattern 51 |
Line grating Period: 800 nm Linewidth: 400 nm Height: 380 nm Area: 20 x 20 mm2 Substrate: Si 20 x 20 mm2 |
|
| Pattern 47 |
Line grating Period: 1300 nm Width: 750 nm Height: 480 nm Area: 2 inch diameter Substrate: Si 2 inch diameter |
|
| Pattern 27 |
Line grating Period: 4000 nm Width: 2000 nm Height: 2000 nm or 2300 nm Area: 32 x 32 mm2 Substrate: Si 32 x 32 mm2 |
|
|
Pattern 68 New! |
Line grating Period: 4800 nm Linewidth: 2200 nm Height: 3200 nm or 2600 nm Area: 25 x 25 mm2 Substrate: Si 20 x 20 mm2 |
|
V型光栅结构
| Part No | Description | Image |
| Pattern 44 |
V groove line grating Period: 10 μm Top Linewidth: 400 nm Height: 5 μm Area: 20 x 20 mm2 Substrate: Ni 20 x 20 mm2 |
|
| Pattern 50 |
Deep v-groove line grating Period: 80 μm Linewidth: 4 μm Height: 7.5 μm Area: 4 inch Substrate: Si 4 inch |
|
矩形和六边形柱状点阵
| Part No | Description | Image |
| Pattern 54 |
Square pillar array Period: 125 nm Diameter: 54 nm Height: 95nm Area: 10 x 10 mm2 Substrate: Si 10 x 10 mm2 |
|
| Pattern 55 |
Square pillar array Period: 125 nm Diameter: 74 nm Height: 95nm Area: 20 x 20 mm2 Substrate: Si 20 x 20 mm2 |
|
| Pattern 31 |
Square pillar array Period: 150 nm Diameter: 62 nm Height: 135 nm Area: 20 x 20 mm2 Substrate: Si 20 x 20 mm2 |
|
| Pattern 61 |
Square pillar array Period: 150 nm Diameter: 80 nm Height: 110 nm Area: 5 x 5 mm2 Substrate: Si 20 x 20 mm2 |
|
| Pattern 48 |
Square pillar array Period: 250 nm Diameter: 115 nm Height: 200 nm Area: 20 x 20 mm2 Substrate: Si 20 x 20 mm2 |
|
| Pattern 1 |
Square pillar array Period: 300 nm Diameter: 145 nm Height: 170 nm Area: 14 x 14 mm2 Substrate: Si 14 x 14 mm2 |
|
| Pattern 29 |
Square pillar array Period: 550 nm Diameter: 300 nm Height: 150 or 300 nm Area: 20 x 20 mm2 Substrate: Si 20 x 20 mm2 |
|
| Pattern 52 |
Square pillar array Period: 800 nm Diameter: 440 nm Height: 250 nm Area: 20 x 20 mm2 Substrate: Si 20 x 20 mm2 |
|
|
Pattern 73 New! |
Hexagonal pillar array Period: 200 nm Diameter: 100 nm Height: 100 nm Area: 20 x 20 mm2 Substrate: Si 20 x 20 mm2 |
|
|
Pattern 70 New! |
Hexagonal pillar array Period: 350 nm Diameter: 130 nm Height: 260 nm Area: 20 x 20 mm2 Substrate: Si 20 x 20 mm2 |
|
| Pattern 67 |
Hexagonal pillar array Period: 400 nm Diameter: 140 nm Height: 100 nm Area: 5 x 5 mm2 Substrate: Si 20 x 20 mm2 |
|
| Pattern 3 |
Hexagonal pillar array Period: 600 nm Diameter: 300 nm Height: 310 nm Area: 20 x 20 mm2 Substrate: Si 20 x 20 mm2 |
|
| Pattern 15 |
Hexagonal pillar array Period: 750 nm Diameter: 325 nm Height: 260 nm Area: 25 x 25 mm2 Substrate: Si 25 x 25 mm2 |
|
| Pattern 7 |
Hexagonal pillar array Period: 1000 nm Diameter: 400 nm Height: 280 nm Area: 20 x 20 mm2 Substrate: Si 26 x 26 mm2 |
|
| Pattern 17 |
Hexagonal pillar array Period: 1010 nm Diameter: 470 nm Height: 750 nm Area: 25 x 25 mm2 Substrate: Si (0.7mm) 25 x 25 mm2 |
|
| Pattern 26 |
Hexagonal pillar array Period: 1732 nm Diameter: 880 nm Height: 590 nm Area: 20 x 20 mm2 Substrate: Si 20 x 20 mm2 |
|
| Pattern 37 |
Hexagonal pillar array Period: 3000 nm Diameter: 1400 nm Height: 5000 nm Area: 20 x 20 mm2 Substrate: Si 20 x 20 mm2 |
|
| Pattern 20 |
Hexagonal pillar array Period: 3000 nm Diameter: 1800 nm Height: 1200 nm Area: 25 x 25 mm2 Substrate: Si 25 x 25 mm2 |
|
| Pattern 39 |
Hexagonal tapered pillar array Period: 600 nm Diameter: top 80 nm, bot 260 nm Height: 160 nm Area: 20 x 20 mm2 Substrate: Quartz 20 x 20 mm2 |
|
| Pattern 41 |
Square tapered pillar array Period: 250 nm Diameter: 136 nm Height: 150 nm Area: 14 x 14 mm2 Substrate: Si 14 x 14 mm2 |
|
矩形和六边形孔阵
| Part No | Description | Image |
|
Pattern 69 New! |
Square hole array Period: 125 nm Diameter: 65 nm Height: 90 nm Area: 20 x 20 mm2 Substrate: 20 x 20 mm2 |
|
| Pattern 62 |
Square hole array Period: 150 nm Diameter: 65 nm Height: 100 nm Area: 5 x 5 mm2 Substrate: Si 20 x 20 mm2 |
|
| Pattern 63 |
Square hole array Period: 200 nm Diameter: 70 nm Height: 110 nm Area: 5 x 5 mm2 Substrate: Si 20 x 20 mm2 |
|
| Pattern 64 |
Square hole array Period: 250 nm Diameter: 70 nm Height: 110 nm Area: 5 x 5 mm2 Substrate: Si 20 x 20 mm2 |
|
| Pattern 24 |
Square hole array Period: 350 nm Diameter: 225 nm Height: 300 nm Area: 20 x 20 mm2 Substrate: Si 20 x 20 mm2 |
|
|
Pattern 74 New! |
Square hole array Period: 200 nm Diameter: 100 nm Height: 100 nm Area: 20 x 20 mm2 Substrate: 20 x 20 mm2 |
|
| Pattern 30 |
Hexagonal hole array Period: 345 nm Diameter: 227 nm Height: 200 nm Area: 20 x 20 mm2 Substrate: Si 20 x 20 mm2 |
|
| Pattern 32 |
Hexagonal hole array Period: 500 , 1000 , 2000 nm Diameter: 50, 100, 200 nm Height: 110 nm Area: 0.2 x 0.2 mm2 each (9x) Substrate: Si 24 x 24 mm2 |
|
| Pattern 4 |
Hexagonal hole array Period: 600 nm Diameter: 300 nm Height: 50 nm Area: 20 x 20 mm2 Substrate: Si 20 x 20 mm2 |
|
| Pattern 16 |
Hexagonal hole array Period: 750 nm Diameter: 380 nm Height: 420 nm Area: 25 x 25 mm2 Substrate: Si 25 x 25 mm2 |
|
| Pattern 36 |
Hexagonal hole array Period: 1010 nm Diameter: 340 or 390 nm Height: 300 nm Area: 15 x 15 mm2 Substrate: Si 15 x15 mm2 |
|
| Pattern 18a |
Hexagonal hole array Period: 1010 nm Diameter: 490 nm Height: 300 nm Area: 25 x 25 mm2 Substrate: Si (0.5mm) 25 x 25 mm2 |
|
| Pattern 18b |
Hexagonal hole array Period: 1010 nm Diameter: 350 nm Height: 470 nm Area: 25 x 25 mm2 Substrate: Si (1mm) 25 x 25 mm2 |
|
| Pattern 21 |
Hexagonal hole array Period: 3000 nm Diameter: 1500 nm Height: 850 nm Area: 20 x 20 mm2 Substrate: Si 25 x 25 mm2 |
|
| Pattern 22 |
Hexagonal hole array Period: 3000 nm Diameter: 1200 nm Height: 1500 nm Area: 20 x 20 mm2 Substrate: Si 25 x 25 mm2 |
|
| Pattern 49 |
Square hole array Period: 500 nm Diameter: 270 nm Height: 400 nm Area: 20 x 20 mm2 Substrate: Si 20 x 20 mm2 |
|
| Pattern 57 |
Square hole array Period: 16.5 µm Width: 10 µm top, 6.5 µm bottom Height: 8.6 µm Area: 20 x 20 mm2 Substrate: Si 24 x 24 mm2 |
|
标准模板三 NEW
纳米及微米结构模板，其衬底材料为硅片。
注意：模板本身未做抗粘处理，如有需要，请联系销售人员。
具体规格如下表所示：
光栅结构 Linear Nanostamps
| Product No. | Period | Linewidth | Depth /Height | Material | Size |
| Pattern 100L -10 | 100nm | 50nm | 130nm | Si | 10mm×10mm |
| Pattern 100L -30 | 100nm | 50nm | 130nm | Si | 30mm×30mm |
| Pattern 140L -10 | 140nm | 70nm | 150nm | Si | 10mm×10mm |
| Pattern 2000L -10 | 2μm | 1μm | 1μm | Si | 10mm×10mm |
| Pattern 2000L -30 | 2μm | 1μm | 1μm | Si | 30mm×30mm |
六边形柱状点阵 Pillars on Hexagonal array
| Product No. | Period | Diameter | Depth /Height | Material | Size |
| Pattern 460P -10 | 460nm | φ230nm | 200nm or 500nm | Si | 10mm×10mm |
| Pattern 460P -15 | 460nm | φ230nm | 200nm or 500nm | Si | 15mm×15mm |
| Pattern 460P -20 | 460nm | φ230nm | 200nm or 500nm | Si | 20mm×20mm |
| Pattern 460P -25 | 460nm | φ230nm | 200nm or 500nm | Si | 25mm×25mm |
| Pattern 460P -30 | 460nm | φ230nm | 200nm or 500nm | Si | 30mm×30mm |
| Pattern 460P -40 | 460nm | φ230nm | 500nm | Si | 40mm×40mm |
六边形孔阵 Holes on Hexagonal array
| Product No. | Period | Diameter | Depth /Height | Material | Size |
| Pattern 460H -10 | 460nm | φ230nm | 200nm | Si | 10mm×10mm |
| Pattern 460H -15 | 460nm | φ230nm | 200nm | Si | 15mm×15mm |
| Pattern 460H -20 | 460nm | φ230nm | 200nm | Si | 20mm×20mm |
| Pattern 460H -30 | 460nm | φ230nm | 200nm | Si | 30mm×30mm |
| Pattern 1000H -10 | 1μm | φ500nm | 500nm | Si | 10mm×10mm |
| Pattern 1000H -30 | 1μm | φ500nm | 500nm | Si | 30mm×30mm |
结构示例：
光栅结构
六边形柱状点阵
六边形孔阵
薄膜软模板
| Product No. | Pattern | Pitch | Width/φ | Depth /Height | Material | Size |
| COP H460-120 | hole | 460nm、 Hexagonal Array | φ230nm | 200nm | COP | φ120mm |
| COP P46-1200 | pillar | 460nm、 Hexagonal Array | φ230nm | 200nm | COP | φ120mm |
| COP P1000-50 | pillar | 1μm、 Hexagonal Array | φ500nm | 500nm | COP | φ50mm |
| COP LS2000-30 | Linear | 2μm | 1μm | 1μm | COP | φ30mm |
| COP LS2000-50 | Linear | 2μm | 1μm | 2μm | COP | φ50mm |
大面积四英寸模板
我们提供四英寸硅或石英模板，可用于压印工艺。批量生产制作，质量有保证且性价比高。
|
产品精度:
|
|
具体规格如下表所示：
Holes on Hexagonal Lattice（六边形孔阵）
|
Part No |
Product |
Period |
Area |
Diameter |
Max. Etch depth (Si/Quartz) |
Image |
|
|
1 |
P200h_h_100d |
200nm |
φ94 mm |
90-120 nm |
120nm/100nm |
|
|
|
2 |
P350h_h_100d |
350nm |
φ94 mm |
120-170 nm |
200nm/100nm |
||
|
3 |
P450h_h_50d |
450nm |
φ50 mm |
220-260 nm |
350nm/150nm |
||
|
4 |
P500h_h_100d new! |
500nm |
φ94 mm |
250-300 nm |
500nm/300nm |
||
|
5 |
P600h_h_100d |
600nm |
φ94 mm |
250-300 nm |
450nm/200nm |
||
|
6 |
P750h_h_51w51 |
750nm |
51x51 mm2 |
250-350 nm |
450nm/200nm |
||
|
7 |
P780h_h_50d |
780nm |
φ50 mm |
250-380 nm |
450nm/200nm |
||
|
8 |
P870_h_100d |
870nm |
φ94 mm |
300-45 0nm |
550nm/250nm |
||
|
9 |
P1000_h_100d |
1000nm |
φ94 mm |
300~500 nm |
600nm/300nm |
||
|
10 |
P1500h_h_51w51 |
1500nm |
51x51 mm2 |
400~650 nm |
600nm/300nm |
||
|
11 |
P1700h_h_100d |
1700nm |
φ94 mm |
500~800 nm |
800nm/400nm |
||
|
12 |
P2000h_h_100d |
2000nm |
φ94 mm |
600~1100 nm |
800nm/400nm |
||
|
13 |
P3000h_h_100d |
3000nm |
φ94 mm |
600~1400 nm |
1000nm/400nm |
||
|
14 |
P3450h_h_100d |
3500nm |
φ94 mm |
800~1600 nm |
1200nm/500nm |
||
|
15 |
P5200h_h_100d |
5200nm |
φ94 mm |
1200~2400 nm |
1200nm/500nm |
||
Holes on Square Lattice（矩形孔阵）
|
Part No |
Product |
Period |
Area |
Diameter |
Max. Etch depth (Si/Quartz) |
Image |
|
|---|---|---|---|---|---|---|---|
|
1 |
P125s_h_90d |
125nm |
φ90mm |
50~70nm |
150nm/100nm |
|
|
|
2 |
P140s_h_80d |
140nm |
Φ80mm |
60~80nm |
150nm/100nm |
||
|
3 |
P150s_h_90d |
150nm |
φ90mm |
60~90nm |
150nm/100nm |
||
|
4 |
P190s_h-100d new! |
190nm |
φ94mm |
85~115nm |
180nm/140nm |
||
|
5 |
P200s_h_90d |
200nm |
φ90mm |
70~120nm |
200nm/150nm |
||
|
6 |
P235s_h_100d new! |
235nm |
φ94mm |
100~135nm |
200nm/150nm |
||
|
7 |
P300s_h_90d |
300nm |
φ90mm |
120~180nm |
200nm/150nm |
||
|
8 |
P350s_h_100d |
350nm |
φ94mm |
240~280nm |
300nm/150nm |
||
|
9 |
P375s_h_100d |
375nm |
φ94mm |
150~250nm |
200nm/100nm |
||
Pillars on Hexagonal Lattice（六边形柱状点阵）
|
Part No |
Product |
Period |
Area |
Diameter |
Max. Etch depth (Si/Quartz) |
Image |
|---|---|---|---|---|---|---|
|
1 |
P200h_p_100d |
200nm |
φ94 mm |
90~120 nm |
120nm/100nm |
|
|
2 |
P450h_p_50d |
450nm |
φ50 mm |
200~250 nm |
350nm/150nm |
|
|
3 |
P500h_p_100d new! |
500nm |
φ94 mm |
200~250 nm |
450nm/200nm |
|
|
4 |
P600h_p_100d |
600nm |
φ94 mm |
200~300 nm |
450nm/200nm |
|
|
5 |
P750h_p_51w51 |
750nm |
51x51 mm2 |
200~350 nm |
450nm/200nm |
|
|
6 |
P780h_p_50d |
780nm |
φ50 mm |
250~350 nm |
450nm/200nm |
|
|
7 |
P870h_p_100d |
870nm |
φ94 mm |
300~400 nm |
550nm/250nm |
|
|
8 |
P1000h_p_100d |
1000nm |
φ94 mm |
300~500 nm |
600nm/300nm |
|
|
9 |
P1500h_p_51w51 |
1500nm |
51x51 mm2 |
400~650 nm |
600nm/300nm |
|
|
10 |
P1700h_p_100d |
1700nm |
φ94 mm |
500~800 nm |
800nm/400nm |
|
|
11 |
P2000h_p_100d |
2000nm |
φ94 mm |
600~1100 nm |
800nm/400nm |
|
|
12 |
P3000h_p_100d |
3000nm |
φ94 mm |
600~1400 nm |
1000nm/400nm |
|
|
13 |
P3450h_p_100d |
3500nm |
φ94 mm |
600~1600 nm |
1200nm/500nm |
|
|
14 |
P5200h_p_100d |
5200nm |
φ94 mm |
600~2000 nm |
1200nm/500nm |
Pillars on Square Lattice（矩形柱状点阵）
|
Part No |
Product |
Period |
Area |
Diameter |
Max. Etch depth (Si/Quartz) |
Image |
|---|---|---|---|---|---|---|
|
1 |
P125s_p_90d |
125nm |
φ90mm |
50~70nm |
90nm/60nm |
|
|
2 |
P140s_p_80d |
140nm |
φ80mm |
50~75nm |
75nm/ — |
|
|
3 |
P150s_p_90d |
150nm |
φ90mm |
60~85nm |
75nm/ — |
|
|
5 |
P250s_p_90d |
250nm |
φ94mm |
110~130nm |
200nm/100nm |
|
|
6 |
P280s_p_80d |
280nm |
Φ80mm |
120~150nm |
200nm/100nm |
|
|
7 |
P300s_p_100d |
300nm |
φ94mm |
120~160nm |
200nm/100nm |
|
|
8 |
P380s_p_100d new! |
380nm |
φ94mm |
160~220nm |
400nm/300nm |
|
|
9 |
P400s_p_100d |
400nm |
φ94mm |
150~220nm |
300nm/100nm |
|
|
10 |
P480s_p_100d new! |
480nm |
φ94mm |
200~270nm |
500nm/400nm |
|
|
11 |
P500s_p_100d |
500nm |
φ94mm |
200~250nm |
400nm/150nm |
|
|
12 |
P560s_p_80d |
560nm |
Φ80mm |
200~280nm |
400nm/150nm |
|
|
13 |
P600s_p_100d |
600nm |
φ94mm |
200~300nm |
500nm/250nm |
|
|
14 |
P760s_p_100d new! |
760nm |
φ94mm |
330~430nm |
700nm/600nm |
|
|
15 |
P800s_p_100d |
800nm |
φ94mm |
200~400nm |
500nm/300nm |
Linear Gratings（光栅结构）
|
Part No |
Product |
Period |
Area |
Width |
Max. Etch depth (Si/Quartz) |
Image |
||
|---|---|---|---|---|---|---|---|---|
|
1 |
P125L-80d |
125nm |
φ80 mm |
50~80 nm |
100nm/80nm |
|
||
|
2 |
P140L_ 80d |
140nm |
φ80 mm |
50~85 nm |
100nm/80nm |
|||
|
3 |
P150L_ 90d |
150nm |
φ90 mm |
60~100 nm |
75nm/80nm |
|||
|
4 |
P200L_ 90d |
200nm |
φ90 mm |
60~120 nm |
150nm/120nm |
|||
|
5 |
P250L_100d |
250nm |
φ94 mm |
90~130 nm |
200nm/100nm |
|||
|
6 |
P280L_80d |
280nm |
φ80 mm |
100~150 nm |
200nm/100nm |
|||
|
7 |
P300L_100d |
300nm |
φ94 mm |
100~160 nm |
300nm/100nm |
|||
|
8 |
P380L_100d new! |
380nm |
φ94 mm |
200~270 nm |
400nm/300nm |
|||
|
9 |
P400L_100d |
400nm |
φ94 mm |
100~200 nm |
300nm/150nm |
|||
|
10 |
P470L_100d new! |
470nm |
φ94 mm |
200~270 nm |
500nm/400nm |
|||
|
11 |
P500L_100d |
500nm |
φ94 mm |
150~250 nm |
400nm/200nm |
|||
|
12 |
P560L_80d |
560nm |
φ80 mm |
15~280 nm |
400nm/200nm |
|||
|
13 |
P600L_100d |
600nm |
φ94 mm |
150~300 nm |
500nm/250nm |
|||
|
14 |
P760L_100d new! |
760nm |
φ94 mm |
320~430 nm |
700nm/600nm |
|||
|
15 |
P800L_100d |
800nm |
φ94 mm |
200~400 nm |
600nm/300nm |
|||
|
16 |
P1000L_100d |
1000nm |
φ94 mm |
200~500 nm |
800nm/400nm |
|||
|
17 |
P1300L_75w55 |
1300nm |
75x55 mm2 |
300~650 nm |
1000nm/500nm |
|||
Multi-pattern（复合结构）
|
Part No |
Product |
Description |
Diameter |
Period |
Area |
Max. Etch depth (Si/Quartz) |
|
1 |
MHSL400-800 |
Linear, hexagonal, square array combination，Periods: 400-800nm |
pitch dependent |
holes/ |
9 x each period，7.5mm x 7.5mm |
400 nm /150 nm |
|
2 |
MP250L300 |
Multi-period linear grating combination 1， Periods: 250nm, 275nm, 300nm |
Linewidth(+/15nm): |
lines |
3 x each period，7mm x 7mm |
200 nm/100 nm |
|
3 |
MP300L600 |
Multi-period linear grating combination 2，Periods: 300nm, 400nm, 500nm, 600nm |
Linewidth (+/- 10%): |
lines |
4 x each period，10mm x 10mm |
300 nm/150 nm |
|
4 |
MP800L1500 |
Multi-period linear grating combination 3，Periods: 800nm, 1000nm, 1200nm, 1500nm |
Linewidth (+/- 10%): |
lines |
4 x each period，20mm x 20mm |
1000 nm/500 nm |
|
5 |
MP500L2050 |
Multi-period linear grating combination 3，Periods: 550nm, 600nm, 650nm……1950nm, 2000nm, 2050nm |
|
lines |
32 x 12mm x 12mm |
600nm/300nm |
如下是复合结构示意图：
|
|
|
| MHSL400-800 | MP250L300 | MP300L600 |
六英寸模板
我们可提供纳米级微结构，衬底材料为硅单晶及少量其它衬底，广泛应用于科学研究。批量生产，质量有保证，且性价比高。
具体规格如下表所示：
| 序号 | 周期(nm) | 类型 | 刻蚀深度(nm) | 衬底尺寸(mm) | 衬底材料 |
| 1 | 250 | line/space | ① | Φ 150 | Si |
| 2 | 250 | line/space | ① | 300 | Si |
| 3 | 275 | line/space | 80 | Φ 150 | Si |
| 4 | 275 | line/space | ① | Φ 150 | Si |
| 5 | 400 | line/space | ① | Φ 150 | Si |
| 6 | 435 | line/space | 135 | Φ 150 | Si |
| 7 | 450 | line/space | ① | Φ 150 | Si |
| 8 | 450 | line/space | 450 | Φ 150 | Si |
| 9 | 458.5 | line/space | 125 | Φ 150 | Si |
| 10 | 458.5 | line/space | ① | Φ 150 | Si |
| 11 | 500 | line/space | ① | Φ 150 | Si |
| 12 | 500 | line/space | 100 | Φ 150 | Si |
| 13 | 800 | line/space | ① | Φ 150 | Si |
| 14 | 2500 | line/space | ① | Φ 150 | Si |
| 15 | 2500 | line/space | 1000 | Φ 150 | Si |
| 16 | 325 | 2d pillar | ① | Φ 150 | Si |
| 17 | 325 | 2d pillar | 100 | Φ 150 | Si |
| 18 | 400 | 2d pillar | ① | Φ 150 | Si |
| 19 | 400 | 2d pillar | 110 | Φ 150 | Si |
| 20 | 450 | 2d pillar | ① | Φ 150 | Si |
| 21 | 450 | 2d pillar | 150 | Φ 150 | Si |
| 22 | 500 | 2d pillar | ① | Φ 150 | Si |
| 23 | 500 | 2d pillar | 100 | Φ 150 | Si |
| 24 | 500 | 2d pillar | 200 | Φ 150 | Si |
| 25 | 800 | 2d pillar | ① | Φ 150 | Si |
| 26 | 1000 | 2d pillar | ① | Φ 150 | Si |
| 27 | 1000 | 2d pillar | 400 | Φ 150 | Si |
| 28 | 1200 | 2d pillar | ① | Φ 150 | Si |
| 29 | 2000 | 2d pillar | ① | Φ 150 | Si |
| 30 | 2000 | 2d pillar | 133 | Φ 150 | Si |
| 31 | 400 | 2d pillar | 140 | Φ 150 | Si |
| 32 | 400 | 2d pillar | 100 SiO2 | Φ 150 | Si +100nm SiO2 |
| 33 | 500 | 2d pillar | ① | Φ 150 | Si |
| 34 | 500 | 2d pillar | 110 | Φ 150 | Si |
| 35 | 500 | 2d pillar | 200 | Φ 150 | Si |
| 36 | 600 | 2d pillar | ① | Φ 150 | Si |
| 37 | 657 | 2d pillar | ① | Φ 150 | Si |
| 38 | 657 | 2d pillar | 300 | Φ 150 | Si |
| 39 | 800 | 2d pillar | ① | Φ 150 | Si |
| 40 | 1000 | 2d pillar | ① | Φ 150 | Si |
| 41 | 1000 | 2d pillar | 160 | Φ 150 | Si |
| 42 | 400 | 2d pillar | ① | Φ 150 | fused silica |
| 43 | 500 | 2d conical pillar | ① | Φ 150 | Si |
| 44 | 800 | hex | 460 | Φ 150 | Si |
| 45 | 200 | hex hole | 460 | Φ 150 | Si |
| 46 | 470 | hex pillar | 125 | Φ 150 | Si |
| 47 | 800 | hex pillar | ① | Φ 150 | Si |
| 48 | 1800 | hex pillar | 475 | Φ 150 | Si |
①：尚未刻蚀
Line / space
2d pillar
2d hole
hex hole
hex pillar
产品中心
厂商分类
微纳制造与加工技术
系统- 高分辨紫外/深紫外光刻机
- 扫描针尖电子束光刻机（SPL）
- CERES微纳金属3D打印系统
- 桌面型纳米压印机
- 去胶机（微波等离子去胶机）
- 微波等离子清洗机
- 微生产（组装）系统
- 德国Zoz Simoloyer® 系列
高能球磨机
组件
真空和薄膜生长技术
系统材料检测及测量技术
实验样品及耗材
┗ 光栅
测试及加工服务
扫码咨询光刻胶、模板
扫码咨询红外测温仪、单晶、靶材
扫码咨询介电阻抗谱、杨氏模量无损测量