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Winning notification
Raith would like to express its gratitude to all its customers taking part at the 4th Raith Micrograph Award for highly sophisticated and scientific applications.
Due to the highest interest since the first Raith Micrograph Award in 1994 and the excellent quality of your submissions, the Raith application team had large shoes to fill deciding on the winner - and finally "no choice" but to extend the number of prizes.
Focussing on the criterion uniqueness of nanostructure, the quality of the image as well as the description of the work, we are glad to declare the winners of this award:
1st place Boudewijn Docter, COBRA / TU Eindhoven, The Netherlands Accurate high-aspect ratio structure: Photonic crystal pillars etched about 4 micrometers into an InP substrate.
2nd place Manuel Decker, Universität Karlsruhe (TH), Germany Fundamental building blocks of a chiral metamaterial consisting of pairs of gold split-ring resonators.
3rd place Jeff Kettle, Cardiff University, Great Britain Step-and Flash Imprint Lithography (S-FIL) imprint of a "motheye" lens.
4th place (offhanded consolation prize) Tang Xiaohu, Universite Catholique de Louvain, Belgium SEM cross-section for a single-electron memory device with self-aligned floating gate (size of about 10 nm) and triangular channel.
Special Art Award "Nano Letters" Elshan Akhadov, Los Alamos National Laboratory, USA Polymeric sheets created by use of energetic neutral atom beam lithography/epitaxy (ENABLE).
Special Art Award "Nano Needles" Philipp Paulitschke, LMU, Germany
GaAs pillars with an aspect ratio just above the limit of mechanical stability.
To see a selection of submitted micrographs, please visit Raith's micrographs gallery.
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1st place 2nd place 3rd place 4th place Special Art Award "Nano Letters" Special Art Award "Nano Needles" |
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